发明名称 METHODS OF FORMING A PLURALITY OF SPACED FEATURES
摘要 A method of forming a plurality of spaced features includes forming sacrificial hardmask material over underlying material. The sacrificial hardmask material has at least two layers of different composition. Portions of the sacrificial hardmask material are removed to form a mask over the underlying material. Individual features of the mask have at least two layers of different composition, with one of the layers of each of the individual features having a tensile intrinsic stress of at least 400.0 MPa. The individual features have a total tensile intrinsic stress greater than 0.0 MPa. The mask is used while etching into the underlying material to form a plurality of spaced features comprising the underlying material. Other implementations are disclosed.
申请公布号 WO2011126680(A2) 申请公布日期 2011.10.13
申请号 WO2011US28450 申请日期 2011.03.15
申请人 MICRON TECHNOLOGY, INC.;GOOD, FARRELL;ZHOU, BAOSUO;FANG, XIAOLONG;SIMSEK-EGE, FATMA, ARZUM 发明人 GOOD, FARRELL;ZHOU, BAOSUO;FANG, XIAOLONG;SIMSEK-EGE, FATMA, ARZUM
分类号 H01L21/027;H01L21/8247;H01L27/115 主分类号 H01L21/027
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