GLASS SUBSTRATE POLISHING METHOD, PACKAGE MANUFACTURING METHOD, PIEZOELECTRIC VIBRATOR, OSCILLATOR, ELECTRONIC DEVICE AND RADIO TIMEPIECE

摘要

A glass substrate polishing method for polishing a glass substrate using a polishing device is provided. The glass substrate polishing method is characterized in that the polishing device includes a surface plate that is rotationally driven around a first central axis, a plate that is rotatable around a second central axis eccentric from the first central axis and presses the glass substrate toward the surface plate, and a work holder that is formed on the plate and restricts movement of the glass substrate in a surface direction while holding the glass substrate in a state in which a central axis of the glass substrate is eccentric from the second central axis. The glass substrate is polished by rotating the surface plate while the glass substrate is rotatably held in the work holder in a state in which an abrasive is interposed between the glass substrate and the surface plate.