PERIPHERY EXPOSURE APPARATUS AND PERIPHERY EXPOSURE METHOD

摘要

Disclosed is a periphery exposure apparatus (1) for exposing the periphery of a substrate (S), which is provided with an exposure head (4), an XY stage (2), and a controller (23). The exposure head (4) has a plurality of light emitting diodes (13), which move relatively to the substrate (S), and which are arranged in the Y direction that orthogonally intersects the X direction. The XY stage (2) moves the exposure head (4) and the substrate (S) relatively to each other. The controller (23) is a control unit for controlling the light emitting state of the light emitting diodes (13), while the light emitting diodes are being relatively moved. The controller (23) turns on the light emitting diodes (13) for exposing the substrate (S). Furthermore, the controller (23) turns off, among the light emitting diodes (13), the second column light emitting diodes (13b), which are to be turned off when exposure is not to be performed, and which correspond to a non-exposure region (32), so as to ensure the non-exposure region (32) in the exposure region (31), while the exposure operation is being performed.