| 摘要 |
PROBLEM TO BE SOLVED: To provide a reflection type mask, an aligner, an exposure method, and a device manufacturing method for effectively reducing a contaminating substance.SOLUTION: The reflection type mask (R) having a pattern domain (Ra) in which a reflection pattern is formed includes additionally a non-pattern domain (Rb) for reflecting or scattering incident light in a direction different from the reflecting direction of the pattern domain (Ra). |
