CURABLE COMPOSITION FOR NANOIMPRINT, SEMICONDUCTOR ELEMENT, AND NANOIMPRINT METHOD

摘要

Disclosed is a curable composition for nanoimprint, which contains (A) a polymerizable compound, (B) a fluorine atom-containing polymer and (C) a radical generator. It is preferable that the content of the fluorine atom-containing polymer (B) is 0.1-10 parts by mass (inclusive) relative to 100 parts by mass of the polymerizable compound (A). It is preferable that the weight average molecular weight of the fluorine atom-containing polymer (B) in terms of polystyrene as determined by gel permeation chromatography is 1,000-30,000 (inclusive). It is preferable that the fluorine atom-containing polymer (B) contains a polymer that has at least one structural unit selected from the group consisting of structural units represented by formula (B-1) and structural units represented by formula (B-2).