| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad allowing excellent end point detection without generating a scratch, when polishing a material to be polished of a metal film by detecting the end point, while supplying slurry to the polishing pad.SOLUTION: This polishing pad is constituted of a polishing layer 1, a cushion layer 4 and a window member 2. The window member 2 is prepared by polymer containing fluorine. The window member 2 includes a through hole having a maximum hole diameter of ≥0.01 mm and ≤0.1 mm from a front surface to a rear surface. |
