RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER AND COMPOUND

摘要

Disclosed is a radiation-sensitive resin composition which includes a radiation-sensitive acid generator [B] and a polymer [A] having a structural unit (I) represented by formula (1). It is preferable that RC in formula (1) is a 4-30 carbon (n+1)valent aliphatic polycyclic hydrocarbon group. It is preferable that the structural unit (I) is a structural unit (I-1) represented by formula (1-1). It is preferable that the composition further contains a polymer [C] which has a lower fluorine atom inclusion amount than the polymer [A] and which preferably contains an acid-cleavable group.