PHASE SHIFT MASK BLANK, MANUFACTURING METHOD THEREOF, AND PHASE SHIFT MASK

摘要

Disclosed are a phase shift mask blank and a manufacturing method thereof capable of increasing the mask service life and of improving the resistance to light of an optical semitransparent film (a phase shift film) configured from a material having as main components nitrogen, silicon and a transition metal for exposure light of wavelength 200nm or less; also disclosed is the phase shift mask. The phase shift mask blank, which is used for creating phase shift masks suitable for ArF excimer laser exposure, is provided with an optical semi-transmissive film on a transparent substrate, wherein the optical semi-transmissive film is configured from an incomplete nitridation film having as main components nitrogen, silicon and a transition metal, and the content ratio of the transition metal to the transition metal and the silicon in the optical semi-transmissive film is less than 9%.