发明名称 COATING TREATMENT METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM AND COATING TREATMENT APPARATUS
摘要 A coating treatment method includes: a first step of discharging a coating solution from a nozzle to a central portion of a substrate while acceleratingly rotating the substrate, to apply the coating solution over the substrate; a second step of then decelerating the rotation of the substrate and continuously rotating the substrate; and a third step of then accelerating the rotation of the substrate to dry the coating solution on the substrate. In the first step, the acceleration of the rotation of the substrate is changed in the order of a first acceleration, a second acceleration higher than the first acceleration, and a third acceleration lower than the second acceleration to acceleratingly rotate the substrate at all times.
申请公布号 US2011250765(A1) 申请公布日期 2011.10.13
申请号 US201113069522 申请日期 2011.03.23
申请人 TOKYO ELECTRON LIMITED 发明人 YOSHIHARA KOUSUKE;ICHINO KATSUNORI
分类号 H01L21/31;B05B1/00;B05C11/10;H01L21/00 主分类号 H01L21/31
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