发明名称 Capacitor, method of manufacturing the same and its use
摘要 A method of manufacturing a capacitor, including: forming a lower electrode on a substrate; forming a dielectric film of a ferroelectric or a piezoelectric on the lower electrode; forming an upper electrode on the dielectric film; and forming a silicon oxide film so that at least the dielectric film is covered with the silicon oxide film, the silicon oxide film being formed by using trimethoxysilane.
申请公布号 EP1758150(B1) 申请公布日期 2011.10.12
申请号 EP20060016703 申请日期 2006.08.10
申请人 SEIKO EPSON CORPORATION 发明人 KOBAYASHI, DAISUKE;NAKAYAMA, MASAO;KIJIMA, TAKESHI
分类号 H01L21/02;B41J2/045;B41J2/055;B41J2/135;B41J2/14;B41J2/16;H01L21/316;H01L21/8246;H01L23/31;H01L27/10;H01L27/105;H01L27/115;H01L41/09;H01L41/187;H01L41/22;H01L41/23;H01L41/311 主分类号 H01L21/02
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