发明名称 |
Capacitor, method of manufacturing the same and its use |
摘要 |
A method of manufacturing a capacitor, including: forming a lower electrode on a substrate; forming a dielectric film of a ferroelectric or a piezoelectric on the lower electrode; forming an upper electrode on the dielectric film; and forming a silicon oxide film so that at least the dielectric film is covered with the silicon oxide film, the silicon oxide film being formed by using trimethoxysilane. |
申请公布号 |
EP1758150(B1) |
申请公布日期 |
2011.10.12 |
申请号 |
EP20060016703 |
申请日期 |
2006.08.10 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
KOBAYASHI, DAISUKE;NAKAYAMA, MASAO;KIJIMA, TAKESHI |
分类号 |
H01L21/02;B41J2/045;B41J2/055;B41J2/135;B41J2/14;B41J2/16;H01L21/316;H01L21/8246;H01L23/31;H01L27/10;H01L27/105;H01L27/115;H01L41/09;H01L41/187;H01L41/22;H01L41/23;H01L41/311 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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