发明名称 MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY CELL AND MAGNETIC RANDOM ACCESS MEMORY USING SAME
摘要 Disclosed are a magnetoresistance effect element equipped with an magnesium oxide passivation layer, and a high-speed, ultra-low power consumption nonvolatile memory using said element. A tunnel magnetoresistance effect (TMR) film comprised of a ferromagnetic free layer, an insulation layer, and a ferromagnetic fixed layer is provided, and an MgO passivation layer is provided on the side walls of a protective layer and an orientation control layer, thus suppressing elemental diffusion of a tunnel magnetoresistance effect (TMR) element from each layer due to thermal processing at 350° or higher and obtaining a magnetic memory cell and magnetic random access memory having stable, high-output reading and a low current writing characteristics. Furthermore, when CoFeB is used in the ferromagnetic layer and MgO is used in the insulation layer, it is preferable that the MgO passivation layer have an (001) orientation.
申请公布号 EP2375465(A1) 申请公布日期 2011.10.12
申请号 EP20090831628 申请日期 2009.11.16
申请人 HITACHI, LTD. 发明人 HAYAKAWA, JUN;TAKAHASHI, HIROMASA
分类号 H01L43/10;H01F10/16;H01F10/32;H01L21/8246;H01L27/105;H01L29/82;H01L43/08 主分类号 H01L43/10
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