PHOTOMASK BLANK AND FABRICATION METHOD THEREFOR, AND PHOTOMASK AND FABRICATION METHOD THEREFOR

摘要

A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon and comprising silicon carbide and/or a transition metal carbide.