发明名称 Lithographic apparatus and device manufacturing method
摘要 A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
申请公布号 US8035798(B2) 申请公布日期 2011.10.11
申请号 US20060482119 申请日期 2006.07.07
申请人 ASML NETHERLANDS B.V. 发明人 SENGERS TIMOTHEUS FRANCISCUS;VAN DE KERKHOF MARCUS ADRIANUS;KROON MARK;VAN WEERT KEES
分类号 G01B15/00;G03B27/42;G03B27/72;G03F7/20;G03F9/00;H01L21/027 主分类号 G01B15/00
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