发明名称 Contact efuse structure
摘要 A contact efuse structure includes a silicon layer and a contact contacting the silicon layer with one end. When a voltage is applied to the contact, a void is formed at the end of the contact, and thus the contact is open. Such structure may be utilized in an efuse device or a read only memory. A method of making a contact efuse device and a method of making a read only memory are also disclosed.
申请公布号 US8035191(B2) 申请公布日期 2011.10.11
申请号 US20080326106 申请日期 2008.12.02
申请人 UNITED MICROELECTRONICS CORP. 发明人 LIN YUNG-CHANG;WU KUEI-SHENG;LIN SAN-FU;SHIH HUI-SHEN
分类号 H01L29/00 主分类号 H01L29/00
代理机构 代理人
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