发明名称 PROCEDURE FOR ELECTROLYTIC NICKEL-PLATING
摘要 FIELD: metallurgy. ^ SUBSTANCE: procedure consists in supply of negative current potential to sample and in supply of positive current potential to nickel electrode. Also, periodically negative potential is supplied to nickel electrode-anode, while positive potential is supplied to additional nickel electrode installed in working volume of galvanic bath. ^ EFFECT: reduced passivation of anode, stability of characteristics of nickel plating process in time at constant current density at nickel sedimentation, facilitation of stable and qualitative characteristics of applied coating such as elasticity and strength. ^ 2 dwg, 2 ex
申请公布号 RU2431000(C2) 申请公布日期 2011.10.10
申请号 RU20090123737 申请日期 2009.06.22
申请人 TOLKACHEV NIKOLAJ IVANOVICH 发明人 TOLKACHEV NIKOLAJ IVANOVICH
分类号 C25D3/12;C25D5/18 主分类号 C25D3/12
代理机构 代理人
主权项
地址