发明名称 VIA STRUCTURE AND METHOD THEREOF
摘要 The invention relates to a layered micro-electronic and/or micro-mechanic structure, comprising at least three alternating electrically conductive layers with insulating layers between the conductive layers. There is also provided a via in a first outer layer, said via comprising an insulated conductive connection made of wafer native material through the layer, an electrically conductive plug extending through the other layers and into said via in the first outer layer in order to provide conductivity through the layers, and an insulating enclosure surrounding said conductive plug in at least one selected layer of said other layers for insulating said plug from the material in said selected layer. It also relates to micro-electronic and/or micro-mechanic device comprising a movable member provided above a cavity such that it is movable in at least one direction. The device has a layered structure according to the invention. Methods of making such a layered MEMS structure is also provided.
申请公布号 KR20110110771(A) 申请公布日期 2011.10.07
申请号 KR20117014438 申请日期 2009.12.23
申请人 SILEX MICROSYSTEMS AB 发明人 EBEFORS THORBJOERN;KAELVESTEN EDVARD;AGREN PETER;SVEDIN NIKLAS;ERICSON THOMAS
分类号 H01L23/522;B81B7/00 主分类号 H01L23/522
代理机构 代理人
主权项
地址