| 发明名称 |
LITHOGRAPHIC TOOL IN SITU CLEAN FORMULATIONS |
| 摘要 |
Compositions and methods of using said composition for removing polymeric materials from surfaces, preferably cleaning contaminant buildup from a lithography apparatus without total disassembly of said apparatus. |
| 申请公布号 |
KR20110110841(A) |
申请公布日期 |
2011.10.07 |
| 申请号 |
KR20117019921 |
申请日期 |
2010.01.26 |
| 申请人 |
ADVANCED TECHNOLOGY MATERIALS INC. |
发明人 |
CHEN TIANNIU;BILODEAU STEVEN;BOGGS KARL E.;JIANG PING;KORZENSKI MICHAEL B.;MIRTH GEORGE;VAN BERKEL KIM |
| 分类号 |
C11D3/43;C11D3/44 |
主分类号 |
C11D3/43 |
| 代理机构 |
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代理人 |
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