发明名称 CHEMICAL SUPPLY SYSTEM
摘要 This invention provides a chemical supply system for supplying chemical solution from a chemical tank. The chemical supply system includes a chemical supply pump, a pressure adjuster configured to suction the chemical solution into the pump chamber by setting the pressure of working gas to a suction pressure, a switching controller configured to switch the suction-side opening-closing valve to the open state for starting to fill the pump chamber with the chemical solution, a pressure detector configured to detect at least one of a gas pressure in a space connected to the working chamber and a gas pressure in the working chamber when the suction-side opening-closing valve is switched to the open state and starts an inflow of the chemical solution to the pump chamber, and a suction controller configured to control the suction pressure applied to the working chamber by the pressure adjuster, based on a detection result of the pressure detector.
申请公布号 KR20110109968(A) 申请公布日期 2011.10.06
申请号 KR20110028038 申请日期 2011.03.29
申请人 CKD CORPORATION 发明人 NAGASAKI ISAO;ITO AKIHIRO;TOYODA TETSUYA
分类号 B05C11/10;G03F7/16;H01L21/027 主分类号 B05C11/10
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