| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus finely detecting a holding state of a substrate.SOLUTION: In the substrate processing apparatus, a first load lock chamber, a second load lock chamber, and two processing chambers are arranged around a transfer chamber, the transfer chamber includes a substrate transfer unit transferring the substrate between the first load lock chamber and the second load lock chamber and the two processing chambers, the substrate transfer unit has an upper arm 74 provided with a first finger 72a and a second finger 72b, and the first finger 72a is formed with a first through-hole 83 and a second through-hole 84. |
