发明名称 TREATMENT APPARATUS FOR FLEXIBLE SUBSTRATE
摘要 A position control device (21, 5) that controls a widthwise position of a flexible substrate 1 includes: a pair of upper nip rollers 21 (24, 25) that nip an upper edge portion of the flexible substrate, rotating shafts of the pair of upper nip rollers being inclined so that a rotation direction in a nipping portion thereof faces obliquely upward at a slight bias angle (α) with respect to a conveying direction of the flexible substrate; an upper support mechanism including a movable support member 26 and a fixed support member 27 that support the pair of upper nip rollers so that the pair of upper nip rollers can be rotated and brought close to, or withdrawn from each other; a spring 51 that biases, via the movable support member, one upper nip roller 25 of the pair of upper nip rollers in a direction of pressing against the other upper nip roller 24 of the pair of upper nip rollers; and drive means (56) for displacing the biasing member so as to adjust a nipping pressure of the pair of upper nip rollers. Occurrence of sagging and wrinkling of the flexible substrate can be inhibited, even when the strip-like flexible substrate is conveyed over a long distance, and a constant widthwise position of the flexible substrate can be maintained, thereby ensuring high-quality treatment.
申请公布号 US2011240225(A1) 申请公布日期 2011.10.06
申请号 US20090737950 申请日期 2009.12.17
申请人 FUJI ELECTRIC HOLDINGS CO., LTD. 发明人 YAMADA TAKANORI;YOKOYAMA SHOJI;FUNO HIDEKAZU;TSUKAHARA YUJI
分类号 B28B19/00;B05C13/00 主分类号 B28B19/00
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