| 发明名称 |
IMMERSION LITHOGRAPHIC APPARATUS, METHOD OF PREVENTING OR REDUCING CONTAMINATION OF THE APPARATUS, AND METHOD OF MANUFACTURING DEVICE |
| 摘要 |
PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus.SOLUTION: The immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d). |
| 申请公布号 |
JP2011199304(A) |
申请公布日期 |
2011.10.06 |
| 申请号 |
JP20110115335 |
申请日期 |
2011.05.24 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS;JANSEN HANS;ANTONIUS LEENDERS MARTINUS HENDRIKUS;VAN DER NET ANTONIUS JOHANNUS;WANTEN PETER FRANCISCUS;VAN DER DONCK JACQUES COR JOHAN;WATSO ROBERT DOUGLAS;VAN DEN DOOL TEUNIS CORNELIS;SCHUH NADJA;CROMWIJK JAN WILLEM |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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