发明名称 SILICON INKS FOR THIN FILM SOLAR SOLAR CELL FORMATION, CORRESPONDING METHODS AND SOLAR CELL STRUCTURES
摘要 High quality silicon inks are used to form polycrystalline layers within thin film solar cells having a p-n junction. The particles deposited with the inks can be sintered to form the silicon film, which can be intrinsic films or doped films. The silicon inks can have a z- average secondary particle size of no more than about 250 nm as determined by dynamic light scattering on an ink sample diluted to 0.4 weight percent if initially having a greater concentration. In some embodiments, an intrinsic layer can be a composite of an amorphous silicon portion and a crystalline silicon portion.
申请公布号 WO2011035306(A3) 申请公布日期 2011.10.06
申请号 WO2010US49661 申请日期 2010.09.21
申请人 NANOGRAM CORPORATION;LIU, GUOJUN;MORRIS, CLIFFORD, M.;ALTMAN, IGOR;SRINIVASAN, UMA;CHIRUVOLU, SHIVKUMAR 发明人 LIU, GUOJUN;MORRIS, CLIFFORD, M.;ALTMAN, IGOR;SRINIVASAN, UMA;CHIRUVOLU, SHIVKUMAR
分类号 H01L31/042;H01L31/0216 主分类号 H01L31/042
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