发明名称 |
PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL |
摘要 |
<p>Disclosed are: a photosensitive composition which contains an aqueous dispersion having excellent storage stability; and a water-developable photosensitive lithographic printing plate material which utilizes the photosensitive composition and has high sensitivity, high image quality, excellent storage stability and excellent processability, while being reduced in generation of sludge, which is derived from the photosensitive composition, in the exhausted developer even after continuous water development. Specifically disclosed is a photosensitive composition which contains at least an aqueous dispersion that is composed of an emulsion-in-water of a photopolymerization initiator and an emulsion-in-water of a compound having a polymerizable double bond group. The photosensitive composition is characterized in that the emulsion-in-water of a photopolymerization initiator and/or the emulsion-in-water of a compound having a polymerizable double bond group is an emulsion-in-water that is obtained by emulsifying and dispersing a photopolymerization initiator or a compound having a polymerizable double bond group into water in the presence of a water-soluble polymer having a sulfonate group and an anionic surfactant.</p> |
申请公布号 |
WO2011122473(A1) |
申请公布日期 |
2011.10.06 |
申请号 |
WO2011JP57346 |
申请日期 |
2011.03.25 |
申请人 |
MITSUBISHI PAPER MILLS LIMITED;FURUKAWA, AKIRA;HAGIHARA, TAKAHIRO |
发明人 |
FURUKAWA, AKIRA;HAGIHARA, TAKAHIRO |
分类号 |
G03F7/033;C08F2/26;G03F7/00;G03F7/004;G03F7/038 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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