| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of precisely calibrating a voltage and a current detected by a high-frequency measurement device.SOLUTION: A calibration parameter X is calculated on the basis of a true value and measurement impedances of three first reference loads by a high-frequency measurement device (S1, 2). Impedance of a plasma processing apparatus is calculated on the basis of a voltage signal and a current signal calibrated by using the calibration parameter X (S3). Three impedances encompassing a range including the impedance calculated in S3 and narrower than that encompassed by the impedances of the three first reference loads are determined on a Smith chart (S4). A calibration parameter X' is calculated on the basis of the true value and measurement impedances of three second reference loads having the respective three impedances by the high-frequency measurement device (S5, 6). The detected voltage signal and the current signal are calibrated by using the calibration parameters X, X' (S7). |
