发明名称 METHOD OF MANUFACTURING HOT-WATER RESISTANT GAS BARRIER FILM AND THE HOT-WATER RESISTANT GAS BARRIER FILM
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a gas barrier film and the gas barrier film by the manufacturing method improving interlayer adhesiveness without depending on oxygen-bonding while preventing amidating or nitriding of a functional group positioned on a surface of a base material.SOLUTION: The manufacturing method includes a plasma treatment process for applying plasma treatment to at least the uppermost surface of a base material film with a plurality of plastic films peelably laminated in advance in an environment of the atmospheric pressure of 0.1 Pa or more and 10 Pa or less under the introduction of inert gas, and a gas barrier layer laminating process for laminating a gas barrier layer having the gas barrier characteristics on the surface after applying the plasma treatment process.
申请公布号 JP2011194805(A) 申请公布日期 2011.10.06
申请号 JP20100066100 申请日期 2010.03.23
申请人 OIKE IND CO LTD 发明人 YOSHIDA YUJI;KOBAYASHI MEGUMI;OGAWA TATSUYA
分类号 B32B38/00;B32B9/00;B32B27/00 主分类号 B32B38/00
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