| 摘要 |
PROBLEM TO BE SOLVED: To provide a bubbler that can select a supply system for a raw material gas to a substrate processing apparatus in accordance with the kind of a liquid raw material and vaporization pressure of the liquid raw material.SOLUTION: The substrate processing apparatus 10 includes: a carrier gas MFC 106, a first valve 107 and a second valve 108 provided to a carrier gas supply line 103 for supplying a carrier gas for bubbling the liquid raw material; a low differential pressure MFC 112, a fourth valve 111 and a fifth valve 113 provided to a raw material gas supply line 109 for supplying the raw material gas, obtained by vaporizing the liquid raw material, into a processing container 200; and a bypass line 115 and a sixth valve 116 branching off from the raw material gas supply line 109 and provided to bypass the low differential pressure MFC 112, fourth valve 111 and fifth valve 113. |
