发明名称 RADIATION-SENSITIVE COMPOSITION, CURED FILM AND METHOD FOR FORMING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition which can be cured by low-temperature heating, has good alkali developability and high radiation sensitivity, and capable of forming a cured film with excellent hardness and solvent resistance.SOLUTION: The radiation-sensitive composition contains[A] an alkali-soluble resin, [B] at least one compound selected from the group consisting of vinyloxyalkyloxetane and vinyloxyaryloxetane compounds, and [C] a compound which generates an acid when energy is imparted thereto.
申请公布号 JP2011197142(A) 申请公布日期 2011.10.06
申请号 JP20100061575 申请日期 2010.03.17
申请人 JSR CORP 发明人 YONEDA EIJI;KAJITA TORU
分类号 G03F7/038;C08F20/06;C08F20/28;C08F20/32;G03F7/004;G03F7/028;G03F7/40;H01L21/027 主分类号 G03F7/038
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