| 摘要 |
A stress layer structure includes an active stress portion and a dummy stress portion, both formed of a stress material and disposed on the substrate. The active stress portion includes first and second active stress patterns in a region where active devices are formed. The first and second active stress patterns coverrespective active regions, and are separated from each other. The dummy stress portion includes a first dummy stress pattern formed directly on the substrate and disposed between and separated from the first and second active stress patterns.
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