PATTERN FORM AND METHOD OF MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To principally provide a pattern form in which characteristics change to a finer pattern form, and a method of manufacturing the same.SOLUTION: The invention relates to the pattern form that has projection surfaces and recess regions formed on a surface thereof, and includes a resin layer characteristics of which change through action of a photocatalyst irradiated with energy, wherein side surfaces and bottom surfaces of the recess regions have characteristics different from those of the projection surfaces.