发明名称 |
ELECTROFORMING MOLD AND METHOD OF PRODUCING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide an electroforming mold which is produced according to a photolithography, is excellent in the fineness and aspect ratio and has an inclination part formed at a photoresist portion to be formed in an external shape, and to provide a method of producing the electroforming mold.SOLUTION: The electroforming mold 1 comprises: a substrate 2 that transmits ultraviolet rays; a conductive film 3 that has electric conductivity on a surface of the substrate and has UV-ray transmissibility; and a first photoresist layer that is formed on the upper surface of the conductive film and has a first through-hole inclined toward the upper surface of the first photoresist layer 4 from the upper surface of the conductive film. |
申请公布号 |
JP2011195911(A) |
申请公布日期 |
2011.10.06 |
申请号 |
JP20100065130 |
申请日期 |
2010.03.19 |
申请人 |
SEIKO INSTRUMENTS INC |
发明人 |
KISHI MATSUO;SATO MIE;NIWA TAKASHI |
分类号 |
C25D1/10;B29C33/38;B29C59/02;G03F7/20 |
主分类号 |
C25D1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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