| 摘要 |
A spinal implant includes an elongated body (12, 112, 212) dimensioned and configured to function as a spacer, for placement in a target interspinous process space, between two adjacent spinous processes (381a, 381b), a distal anchor (20, 120, 220) associated with a distal end of the body, and a proximal anchor (30, 130, 230) mounted for longitudinal movement along the body between a first position spaced apart from the distal anchor and a second position approximated with the distal anchor, adapted to compress the two adjacent spinous processes, in conjunction with the distal anchor. |
