| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for inspecting an object such as a mask for microlithography.SOLUTION: The apparatus for inspecting an object OF such as, especially, a mask for microlithography that is present in a vacuum chamber includes a converter for converting illuminating light emitted from the object into a light ray of a further large wavelength, and a sensor for recording an image, wherein the sensor is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image-forming objective lens O is arranged as a window in the vacuum chamber. |
