发明名称 FILM-DEPOSITION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a film-deposition device capable of stably producing a functional film preventing floating of a substrate from a drum caused by heating of the substrate and suppressing heat damage of the substrate caused by the floating from the drum in the film-deposition device performing film-deposition while a long substrate is wound around the drum and conveyed in a longitudinal direction.SOLUTION: The film-deposition device has a biasing unit abutting on a non-product region of the substrate wound around the drum and biasing the substrate to an outer side in the with direction of the substrate while conveyed together with the substrate.
申请公布号 JP2011195899(A) 申请公布日期 2011.10.06
申请号 JP20100064197 申请日期 2010.03.19
申请人 FUJIFILM CORP 发明人 FUJINAWA ATSUSHI;TONOHARA KOUJI
分类号 C23C16/44;H01L21/31 主分类号 C23C16/44
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