DEVICE FOR SUPPORTING A ROTATABLE TARGET AND SPUTTERING INSTALLATION

摘要

A device (100) for supporting a rotatable target (10) and deposition apparatus (200) having such a device (100) are provided. The device includes a main body (110), a first fluid conduit (131) in the main body (110) for receiving a fluid from the rotatable target (10), and a second fluid conduit (132) in the main body (110) for providing the fluid to the rotatable target (10). The projections of the first fluid conduit (131) and the second fluid conduit (132) onto a projection plane that extends in the direction of the rotational axis (50) of the rotatable target (10) overlap each other.