| 摘要 |
PROBLEM TO BE SOLVED: To provide a mixture film forming device equipped with a measurement device for simultaneously detecting the film thickness and the composition of a mixture film formed by simultaneous vapor deposition of a plurality of materials.SOLUTION: In the mixture film forming device for forming a mixture film comprising n pieces of materials on a vapor deposition object, when light beams at a plurality of wavelengths λ1, λ2, ..., λn are introduced to obliquely enter the vapor deposition object toward the film, a part of the incident light is absorbed in the mixture film while the rest of the light is totally reflected on the surface of the mixture film. As an attenuation rate of the light propagating again in the vapor deposition object after total reflection is expressed by Rλ1=f1(d1, d2, ..., dn), Rλ2=f2(d1, d2, ..., dn), ..., Rλn=fn(d1, d2, ..., dn) with respect to the original intensity of the light, d1, d2, ..., dn are obtained by measuring Rλ1, Rλ2, ..., Rλn and solving the above simultaneous equations. Thus, the mixture film is formed while simultaneously measuring transition in the composition and the film thickness of the mixture film deposited on the vapor deposition object with time. |
