发明名称 THIN FILM SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THIN FILM SEMICONDUCTOR DEVICE
摘要 In a display device that provides a first observation region with a first picture and provides a second observation region with a second picture, a double image made of the first picture and the second picture is suppressed. First columns of pixels that display the first picture and second columns of pixels that display the second picture are disposed alternately with a black matrix interposed between each neighboring pair of them. A light-shielding plate having light-shielding portions and openings is disposed above the panel. When a distance between the first observation region and the second observation region is denoted by V, a distance between the first observation region or the second observation region and the light-shielding plate is denoted by D, a distance between the light-shielding plate and the display panel is denoted by G, an interval of the first columns of pixels or the second columns of pixels is denoted by P, and the width of the black matrix is denoted by Q, an equation K≰Q×D/(D+G) is satisfied. The openings are disposed on lines connecting between a position directly above a center of the display panel and the black matrix.
申请公布号 US2011242466(A1) 申请公布日期 2011.10.06
申请号 US201113161725 申请日期 2011.06.16
申请人 SONY CORPORATION 发明人 HAMAGISHI GORO
分类号 G02F1/1333 主分类号 G02F1/1333
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