| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method capable of forming a predetermined pattern on a substrate.SOLUTION: The exposure method includes a step of forming an immersion region (LR) on the substrate (P); a step of exposing the substrate (P) by irradiating the substrate (P) with exposure light (EL) via a liquid (LQ) in the immersion region (LR); and a step of preventing an integrated value of contact time, during which the liquid (LQ) in the immersion region (LR) makes contact with first regions (S1 to S37, 101) on the substrate (P) from exceeding a predetermined tolerance value. |
