发明名称 METHOD OF MANUFACTURING BARRIER FILM
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a gas barrier film with high productivity which can achieve very high gas barrier performance and high durability.SOLUTION: The method of manufacturing a barrier film includes carrying out a process of applying a coating liquid containing a polysilazane to the surface of a substrate and drying and then forming a barrier layer by reforming the polysilazane through a process of irradiating the substrate with vacuum UV light from the side of the coated surface. Together with the irradiation of to-be-reformed sites with the vacuum UV light, a gas based on a gas ingredient not absorbing the vacuum UV light is sprayed onto the sites, and the gas spraying condition meets equation (1): 50≤T×Q/W/L≤150 (wherein, T is the temperature [°C]of the sprayed gas; Q is the flow rate [m/min] of the sprayed gas; W is the width, [m] of spraying of the gas; and L is the speed [m/min] of carrying the substrate).
申请公布号 JP2011194319(A) 申请公布日期 2011.10.06
申请号 JP20100063866 申请日期 2010.03.19
申请人 KONICA MINOLTA HOLDINGS INC 发明人 ITO SATOSHI
分类号 B05D3/06;B32B9/00;B32B27/00 主分类号 B05D3/06
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