| 摘要 |
PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition which is excellent in sensitivity, roughness characteristics and stability with time, and can form a pattern in a favorable shape, and suppresses PEB (post exposure bake) temperature dependence, and to provide a resist film formed by using the composition and a pattern forming method using the composition.SOLUTION: The active ray-sensitive or radiation-sensitive resin composition contains a compound (A) having an amine oxide group and a photo-acid generating region. |
