| 发明名称 |
PLASMA TREATMENT BETWEEN DEPOSITION PROCESSES |
| 摘要 |
<p>Embodiments of the present invention include an improved method of forming a thin film solar cell device using a plasma processing treatment between two or more deposition steps. Embodiments of the invention also generally provide a method and apparatus for forming the same. The present invention may be used to advantage to form other single junction, tandem junction, or multi-junction solar cell devices.</p> |
| 申请公布号 |
EP2215652(A4) |
申请公布日期 |
2011.10.05 |
| 申请号 |
EP20080846195 |
申请日期 |
2008.10.31 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CHOI, SOO YOUNG;CHAE, YONG KEE;SHENG, SHURAN;LI, LIWEI |
| 分类号 |
H01L21/02;H01L21/205;H01L31/0236;H01L31/075;H01L31/18;H01L31/20 |
主分类号 |
H01L21/02 |
| 代理机构 |
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