| 发明名称 |
REDUCED PITCH MULTIPLE EXPOSURE PROCESS |
| 摘要 |
A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.
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| 申请公布号 |
US2011244401(A1) |
申请公布日期 |
2011.10.06 |
| 申请号 |
US201113160980 |
申请日期 |
2011.06.15 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
PAXTON THEODORE A.;DAVIS TODD J.;HIAR TODD D.;OWEN CASSANDRA MAY;HANSEN STEVEN GEORGE;HUNTER JAMES J. |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
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