发明名称 Device for supporting a rotatable target and sputtering installation
摘要 <p>A device (100) for supporting a rotatable target (10) and deposition apparatus (200) having such a device (100) are provided. The device includes a main body (110), a first fluid conduit (131) in the main body (110) for receiving a fluid from the rotatable target (10), and a second fluid conduit (132) in the main body (110) for providing the fluid to the rotatable target (10). The projections of the first fluid conduit (131) and the second fluid conduit (132) onto a projection plane that extends in the direction of the rotational axis (50) of the rotatable target (10) overlap each other.</p>
申请公布号 EP2372744(A1) 申请公布日期 2011.10.05
申请号 EP20100159022 申请日期 2010.04.01
申请人 APPLIED MATERIALS, INC. 发明人 SCHNAPPENBERGER, FRANK
分类号 H01J37/34 主分类号 H01J37/34
代理机构 代理人
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