发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 The invention provides a photosensitive resin composition containing resin, a photopolymerizable composition, a photo-polymerization initiator, photo-polymerization co-initiator containing thioxanthones compound and a solvent, wherein the photo-polymerization initiator contains alpha amino ketone compound, biimidazole compound and oxime compound, and the content of the thioxanthones compound is 80-160 parts by mass relative to 100 parts by mass of alpha amino ketone compound.
申请公布号 KR20110108268(A) 申请公布日期 2011.10.05
申请号 KR20110024761 申请日期 2011.03.21
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 TAKEBE KAZUO;INOUE KATSUHARU;MATSUURA RYUICHI
分类号 G03F7/031;G02F1/13 主分类号 G03F7/031
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