发明名称 RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME
摘要 <p>The present invention provides a resin obtained by reacting a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a C1-C6 alkyl group, R2, R3 and R4 each independently represents a C1-C6 alkyl group and R1, R2, R3, R4 and A1 are bonded to form a ring, A1 represents a C1-C20 saturated hydrocarbon group in which one or more—CH2—can be replaced by—O—, B1 and B2 each independently represent a C1-C6 alkylene group, L1 and L2 each independently represent a halogen atom,—O—CH═CH2,—O—CH═CH(CH3) or—O—SO2—R′in which R′represents a C1-C6 alkyl group or a C6-C20 aryl group, with a polyhydric phenol compound.</p>
申请公布号 KR20110108277(A) 申请公布日期 2011.10.05
申请号 KR20110025672 申请日期 2011.03.23
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 TAKEMOTO ICHIKI;ANDO NOBUO
分类号 C08G63/02;C07C69/74;C08F20/12;G03F7/004 主分类号 C08G63/02
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