发明名称 GeSiSn-based compounds, templates, and semiconductor structures
摘要 The present invention provides novel compounds of the formula Gei-x-ySixSny, wherein 0.01<y<0.11, and 0.26<x<0.35, and semiconductor structures comprising such compounds. The present invention also provides novel semiconductor structures comprising silicon substrates, an SiGe buffer layer, and a Group III-V or II-VI active layer. The present invention also provides novel semiconductor structures comprising silicon substrates, an SiGe buffer layer, an SiGeSn template layer, and an SiGe, Ge, Group III-V, or Group II-VI active layer.
申请公布号 US8029905(B2) 申请公布日期 2011.10.04
申请号 US20060908143 申请日期 2006.03.10
申请人 ARIZONA BOARD OF REGENTS, A BODY CORPORATE OF THESTATE OF ARIZONA ACTING FOR AND ON BEHALF OF ARIZONA STATE UNIVERSITY 发明人 KOUVETAKIS JOHN;ROUCKA RADEK
分类号 B32B15/04;C01B33/00 主分类号 B32B15/04
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