发明名称 |
Method of manufacturing micro structure, and method of manufacturing mold material |
摘要 |
Disclosed herein are a method of producing microstructure and a method of producing mold, the methods permitting production of much smaller pores than before in an atmosphere where impurities are negligible and also permitting production of microstructures having a smaller size and a higher crystallinity than before with the help of the pores. The method of producing microstructure comprises a step of making pores (4) in a substrate (1) to become a mold (5) by irradiation with a focused energy beam (3) and a step of growing a microstructure (8) in the thus made pores (4). The method of producing a mold includes a step of making pores (4) by irradiating a substrate (1) to become a mold (5) with a focused energy beam (3).
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申请公布号 |
US8030191(B2) |
申请公布日期 |
2011.10.04 |
申请号 |
US20090471643 |
申请日期 |
2009.05.26 |
申请人 |
SONY CORPORATION |
发明人 |
KADONO KOJI;MURAKAMI YOSUKE |
分类号 |
B82B3/00;H01L21/00;B01J23/75;B01J37/02;B01J37/03;B01J37/34;B82B1/00;C01B31/02;C23C16/44;C23C16/48;H01J9/02 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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