发明名称 Method of manufacturing micro structure, and method of manufacturing mold material
摘要 Disclosed herein are a method of producing microstructure and a method of producing mold, the methods permitting production of much smaller pores than before in an atmosphere where impurities are negligible and also permitting production of microstructures having a smaller size and a higher crystallinity than before with the help of the pores. The method of producing microstructure comprises a step of making pores (4) in a substrate (1) to become a mold (5) by irradiation with a focused energy beam (3) and a step of growing a microstructure (8) in the thus made pores (4). The method of producing a mold includes a step of making pores (4) by irradiating a substrate (1) to become a mold (5) with a focused energy beam (3).
申请公布号 US8030191(B2) 申请公布日期 2011.10.04
申请号 US20090471643 申请日期 2009.05.26
申请人 SONY CORPORATION 发明人 KADONO KOJI;MURAKAMI YOSUKE
分类号 B82B3/00;H01L21/00;B01J23/75;B01J37/02;B01J37/03;B01J37/34;B82B1/00;C01B31/02;C23C16/44;C23C16/48;H01J9/02 主分类号 B82B3/00
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