发明名称 Semiconductor substrates with unitary vias and via terminals, and associated systems and methods
摘要 Semiconductor substrates with unitary vias and via terminals, and associated systems and methods are disclosed. A representative method in accordance with a particular embodiment includes forming a blind via in a semiconductor substrate, applying a protective layer to a sidewall surface of the via, and forming a terminal opening by selectively removing substrate material from an end surface of the via, while protecting from removal substrate material against which the protective coating is applied. The method can further include disposing a conductive material in both the via and the terminal opening to form an electrically conductive terminal that is unitary with conductive material in the via. Substrate material adjacent to the terminal can then be removed to expose the terminal, which can then be connected to a conductive structure external to the substrate.
申请公布号 US8030780(B2) 申请公布日期 2011.10.04
申请号 US20080253121 申请日期 2008.10.16
申请人 MICRON TECHNOLOGY, INC. 发明人 KIRBY KYLE K.;PAREKH KUNAL R.
分类号 H01L23/52;H01L23/48;H01L29/40 主分类号 H01L23/52
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