| 摘要 |
Provided is a sputtering target which can give a high water barrier property and a high flexibility to a sputtering film, can keep a high film forming rate certainly in sputtering, and can make damages to an objective substance wherein a film is to be formed as small as possible. In order to realize this, a mixed powder which contains 20 to 80% by weight of a SiO powder, the balance of the powder being made of a TiO2 powder and/or a Ti powder, is pressed and sintered. The sintered body has a composition of SiαTi&bgr;Oγ wherein α, &bgr; and γ are mole ratios of Si, Ti and O, respectively, and the ratio of α/&bgr; ranges from 0.45 to 7.25 and the ratio of γ/(α+&bgr;) ranges from 0.80 to 1.70.
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