发明名称 RESIST PATTERN FORMING METHOD AND FINE STRUCTURE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a resist pattern forming method and a fine structure manufacturing method, in which resist pattern deformation can be suppressed. <P>SOLUTION: The resist pattern forming method for forming a resist pattern on a surface of a substrate includes a step of forming the resist pattern so that the size of an end of the resist pattern on the substrate side is longer than that of an end thereof on a side opposed to the end on the substrate side. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011192906(A) 申请公布日期 2011.09.29
申请号 JP20100059424 申请日期 2010.03.16
申请人 TOSHIBA CORP 发明人 YAMANE OSAMU;MASUKAWA KAZUYUKI;MITSUYOSHI YASURO
分类号 H01L21/027;G03F7/40 主分类号 H01L21/027
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