| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic-ray- or radiation-sensitive resin composition that excels in the roughness characteristics, exposure latitude, depth of focus, and development defect performance and that allows to form a pattern of favorable configuration, and to provide a method of forming a pattern using the composition. <P>SOLUTION: The actinic-ray- or radiation-sensitive resin composition comprises a resin containing a repeating unit (A) containing both a structural moiety (S1) that is decomposed by an action of an acid to thereby generate an alkali-soluble group and a structural moiety (S2) that is decomposed by an action of an alkali developer to thereby increase its rate of dissolution into the alkali developer, and a compound that generates an acid by irradiation with actinic rays or radiation. <P>COPYRIGHT: (C)2011,JPO&INPIT |
